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Benchmarks
2D lithography mask simulation 11.2 nm wavelength (test)
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3.3
Relative L2 Error
PINN
3.292
3.346
3.4
3.454
Mar 16, 2026
Relative L2 Error
Training Time (s)
Inference Time (s)
Updated 4mo ago
Evaluation Results
Method
Method
Links
Relative L2 Error
Training Time (s)
Inference Time (s)
PINN
2026.03
3.3
1,252
1.2
WGNO
2026.03
3.5
7.7
1.8
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