Share your thoughts, 1 month free Claude Pro on us
See more
Home
/
Benchmarks
3D lithography mask simulation on 3D lithography mask simulation 13.5 nm
Loading...
3.1
Relative L2 Error
WGNO
2.945
3.0225
3.1
3.1775
Mar 16, 2026
Relative L2 Error
Updated 4mo ago
Evaluation Results
Method
Method
Links
Relative L2 Error
WGNO
Inference (s)=2.24 × 1...
2026.03
3.1
Feedback
Search any
task
Search any
task
