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3D lithography mask simulation 11.2 nm

2.8Rel. L2 Error

WGNO

Updated 4mo ago

Evaluation Results

Method	Links
WGNO 2026.03		2.8

SOTA Paper

WGNO

Physics-Informed Neural Systems for the Simulation of EUV Electromagnetic Wave Diffraction from a Lithography Mask

Dataset

3D lithography mask simulation

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Related Benchmarks

Electromagnetic Wave Simulation on 2D problems Wave propagation 1.0 (test)Electromagnetic Wave Simulation on 2D Wave Scattering Interface (test)Electromagnetic wave simulation on 2D problems Reflection from layer 1.0 (test)2D Lithography Mask Simulation on 13.5 nm Wavelength (test)2D lithography mask simulation 11.2 nm wavelength (test)

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